OHNISHI Osamu

写真a

Affiliation

Engineering educational research section Mechanical Intelligence Engineering Program

Title

Associate Professor

External Link

Degree 【 display / non-display

  • 博士(工学) ( 1999.3   九州大学 )

  • 修士 ( 1996.3   九州大学 )

  • 学士 ( 1994.3   九州大学 )

Research Areas 【 display / non-display

  • Manufacturing Technology (Mechanical Engineering, Electrical and Electronic Engineering, Chemical Engineering) / Manufacturing and production engineering

 

Papers 【 display / non-display

  • Development of a laser-guiding-type deep small-sized hole-measurement system: Measurement accuracy Reviewed

    Akio Katsuki, Takao Sajima, Hiroshi Murakami, Ali MdHazrat, Osamu Ohnishi, Kouji Akashi

    Precision Engineering   63   18 - 32   2020.5

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Study on Fabrication of Electroplated Tools with High Performance: Influence of Conditions such as Stirring on Electroplated Layer Reviewed

    Osamu Ohnishi

    Transactions of MIRAI   7   28 - 31   2019.8

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    Language:English   Publishing type:Research paper (international conference proceedings)  

  • Effects of Wire EDM Conditions on Slicing Performance for Silicon Reviewed

    Osamu Ohnishi, Toshiro Doi, Syuhei Kurokawa

    Transactions of MIRAI   4   30 - 35   2016.8

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    Language:English   Publishing type:Research paper (international conference proceedings)  

  • Preparation and characterization of composite coatings containing a quaternary ammonium salt as an anti-static agent

    Kugimoto Y., Wakabayashi A., Dobashi T., Ohnishi O., Doi T., Kurokawa S.

    Progress in Organic Coatings   92   80 - 84   2016.3

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    Language:Japanese   Publishing type:Research paper (scientific journal)   Publisher:Progress in Organic Coatings  

    © 2015 Elsevier B.V. All rights reserved. The main aim of the present study is to manufacture antistatic sheets with high transparency and high electrical conductivity by dip coating. Here, we used coating solutions consisting of a quaternary ammonium salt, a urethane acrylate oligomer, a photoinitiator, and a mixture of solvents which contains a water-soluble high boiling solvent of monobutyl glycol ether, 2-butoxyethanol. The coating solutions were deposited on polymethyl methacrylate (PMMA) substrates, which were subjected to a two-step drying process at 23 °C and at 60 °C, and subsequently cured by ultraviolet radiation. We have examined the effect of the concentration of the water-soluble monobutyl glycol ether, relative humidity (RH) at the first step, and drying time on the electrical conductivity, contact angle, and optical transmittance and haze of the coated layers. The surface electrical resistivity (ρ s ) monotonically decreased with the concentration of the monobutyl glycol ether, RH, and drying time. The water contact angle of the surface of the coated layers increased with decrease in ρ s . These results strongly suggest a migration and fixation of the quaternary ammonium salt at the air/layer interface during the drying process. The coated PMMA sheet prepared under the optimal condition showed fairly good performance in terms of the optical and electrical properties.

    DOI: 10.1016/j.porgcoat.2015.11.013

    Scopus

  • Preparation and characterization of composite coatings containing a quaternary ammonium salt as an anti-static agent Reviewed

    Yuki Kugimoto, Atsumi Wakabayashi, Toshiaki Dobashi, Osamu Ohnishi, Toshiro K. Doi, Syuhei Kurokawa

    Progress in Organic Coatings   92   80 - 84   2016.3

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    Language:English   Publishing type:Research paper (scientific journal)  

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Books 【 display / non-display

  • Handbook of Ceramics Grinding and Polishing

    Marinescu ほか( Role: Joint author)

    William Andrew  2014.11 

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    Language:English Book type:Scholarly book

MISC 【 display / non-display

  • 機械工学年鑑

    久保司郎ほか

    日本機械学会誌   117 ( 1149 )   555 - 555   2014.8

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    Language:Japanese   Publishing type:Research paper, summary (national, other academic conference)   Publisher:日本機械学会誌  

  • 化合物半導体基板の研磨/CMP加工-加工メカニズムに基づくGaAs結晶とCdTe結晶のCMPスラリー-

    大西 修, 山崎 努, 會田 英雄, 黒河 周平, 土肥 俊郎

    砥粒加工学会誌   56 ( 9 )   596 - 599   2012.9

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    Language:Japanese   Publishing type:Research paper, summary (national, other academic conference)   Publisher:砥粒加工学会  

  • 半導体デバイスプロセスにおける超精密CMP技術の動向

    土肥 俊郎, 大西 修, 黒河 周平, 畝田 道雄, 山崎 努

    O plus E   34 ( 7 )   594 - 601   2012.9

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    Language:Japanese   Publishing type:Article, review, commentary, editorial, etc. (scientific journal)   Publisher:アドコム・メディア  

Awards 【 display / non-display

  • Excellent Research Award

    2019.8   The 12th MIRAI Conference on Microfabrication and Green Technology   Study on Fabrication of Electroplated Tools with High Performance: Influence of Conditions such as Stirring on Electroplated Layer

    Osamu OHNISHI

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    Award type:Award from international society, conference, symposium, etc.  Country:Japan

  • Excellent Paper Award

    2016.8   The 9th MIRAI Conference on Microfabrication and Green Technology   Effects of Wire EDM Conditions on Slicing Performance for Silicon

    Osamu OHNISHI, Toshiro DOI, Syuhei KUROKAWA

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    Award type:Award from international society, conference, symposium, etc.  Country:Japan

  • Excellent Poster Award

    2012.7   Review Commitee of Award, The Third International Conference on nanoManufacturing: nanoMan2012  

    Osamu OHNISHI, Toshiro DOI, Syuhei KUROKAWA, Kazuo TAKAHASHI, Fusao FUJITA, Hiroshi MIZUE, Yukihito KIDO

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    Award type:Award from international society, conference, symposium, etc.  Country:Japan

Grant-in-Aid for Scientific Research 【 display / non-display

  • 次世代型マルチレンジ対応純氷ブロック砥石の開発

    Grant number:18K03877  2018.04 - 2022.03

    科学研究費補助金  基盤研究(C)

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    Authorship:Principal investigator